Welcome to the home page of The Laboratory for Advanced Surface Planarization (LASP) at Clarkson University. The research laboratory was established in 1990 by Professor Yuzhuo Li and for the past 17 years, the research group has carried out a wide range of research projects including organic and polymer synthesis, photocatalysis, and application of nanomaterials for microelectronic applications. The sponsors of these projects include National Science Foundation (NSF), National Institutes of Health (NIH), Environmental Protection Agency (EPA), American Chemical Society (ACS), General Electric (GE), PPG Industries, DuPont, DuPont Pharmaceuticals, Bristol-Meyer Squibb, Wyeth Pharmaceuticals, IBM, Ferro Microelectronic Materials, Seagate, Fujimi, Dynea, and BASF. More than 100 journal publications and conference proceedings have been generated by the work conducted by the research group.  More than 220 invited and contributed talks around the world have been given on the research topics. Eleven patents have been granted based on our work at Clarkson University. Presently, the major specialty of this group is working on to deliver novel ideas and strategies in the field of Chemical Mechanical Planarization (CMP). Please take a moment to browse through our research interests and facilities available in our lab to provide the cutting edge research. More importantly, you can also find information of different personalities behind the success of this group.

 

New instruments Foam tester and Dynotester have been purchased to improvise the cleaner formulations for post-CMP applications.

Professor Yuzhuo Li joins BASF: BASF is pleased to announce that Professor Yuzhuo Li from Clarkson University, United States, has joined the company. Li, a leading expert in the area of chemical mechanical planarization (CMP), will lead BASF’s global CMP research and development team to develop innovative solutions for the semiconductor industry (source: www.basf.com). Read more...

October 31 - People from Dr. Li's and Dr. Babu's group attended AFM training. CMP application note can be downloaded here!!

October 26 - Long Range AFM (Park Systems) has arrived. Park Systems Atomic Force Microscopes provide the accurate local site and global long-range data manufacturers need to monitor polishing equipment performance, control erosion and dishing, and improve yield.

October 1 - Dr. Li's group received Filmtek 2000 relfectometer

CMP book written by few members of the group and edited by Dr. Li has been published. Please click the image of the book to get more information.

 

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Last updated: 02/26/2008 18:59:25 -0500