Laboratory for Advanced Surface Planarization (LASP)

 
 
Facility for CMP research

Wafer Polishers

Particle Characterization

  1. ALV dynamic light scattering

  2. ALV dynamic and static light scattering

  3. Accusizer 770A

  4. Brightwell single particle analyzer

  5. Brookhaven Zeta PAL

  6. Matec Applied Science APS 100

  7. Matec Applied Science ESA 9800

  8. NIR

  9. UV-Vis spectroscopy

Other instruments

  1. Thermal gravimetric analyzer

  2. JEOL 2010 high resolution scanning transmission electron microscope

  3. JEOL 7400 high resolution field emission scanning electron microscope

  4. Bruker D8 X-ray diffraction

 

  1. Strasbaugh 6EG nHance

  2. Westech 372m with 4100 cleaning station

  3. Westech 372

  4. Speedfam/IPEC 676

  5. GnP Intelligent

  6. CETR tribometer w/ECMP capability

  7. Benchtop ECMP polisher

Thin Film Metrology

  1. KLA Tencor RS35 sheet resistivity measurement

  2. KLA Tencor RS100 sheet resistivity measurement

  3. Filmetrics reflectometer

  4. Filmetrics reflectometer F50

  5. Filmtek 2000

  6. Ambios XP-2 stylus profilometer

  7. PISA AFM

  8. Burleigh Horizon non-contact optical profilometer

  9. Contact angle measurement

  10. Wollam Multi-wavelength Ellipsometry

  11. Impedance spectroscopy

  12. Hysitron nano-indentor

  13. KLA Tencor 7700m wafer inspection system

  14. Zygo 6000

  15. KLA Tencor Candela 6100

  16. Thermo confocal microscope combination with Raman

 

 

 

 

 

 

 
     
 
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Last updated: 11/30/2007 20:25:46 -0500